The Polycold Fast Cycle Water Vapor Cryopump (PFC) effectively

captures water vapor, which comprises 65% to 95% of the residual

gas in high-vacuum systems. Water vapor is typically the most

reactive contaminant present. With the PFC 1102, you can expect to

increase product throughput in your existing system 20% to 100%

and improve quality of deposition.

Model:  

PFC1102, PFC672, PFC552 and PFC/PFC1102, PFC/PFC672, PFC/PFC552

The PFC Advantage

• High-vacuum pumpdown time cut by 25% to 75%

• High-speed pumping of water vapor: up to 200,000 l/sec in the workspace

• Increased product throughput of 20% to 100%

• Typical payback times of less than one year

• Lower water vapor partial pressure during processing for higher film quality, better adhesion and more reproducible deposition

• Superiorin cost/performance to liquid nitrogen cooled Messiness.

 Scope of application:

1. Semiconductor

2. Solar  

3. Optical Fiber

4. FPD

5. Optical coating, winding coating, Decorate coating.